High-resolution study of x-ray resonant Raman scattering at the K edge of silicon.

نویسندگان

  • J Szlachetko
  • J-Cl Dousse
  • J Hoszowska
  • M Pajek
  • R Barrett
  • M Berset
  • K Fennane
  • A Kubala-Kukus
  • M Szlachetko
چکیده

We report on the first high-resolution measurements of the K x-ray resonant Raman scattering (RRS) in Si. The measured x-ray RRS spectra, interpreted using the Kramers-Heisenberg approach, revealed spectral features corresponding to electronic excitations to the conduction and valence bands in silicon. The total cross sections for the x-ray RRS at the 1s absorption edge and the 1s-3p excitation were derived. The Kramers-Heisenberg formalism was found to reproduce quite well the x-ray RRS spectra, which is of prime importance for applications of the total-reflection x-ray fluorescence technique.

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عنوان ژورنال:
  • Physical review letters

دوره 97 7  شماره 

صفحات  -

تاریخ انتشار 2006